Arie den Boef

发表

Fabrication of metrology test structures for future technology nodes using high-resolution variable-shaped e-beam direct write

László Szikszai, Philipp Jaschinsky, Katja Keil, 2009, Advanced Lithography.

Sub-nanometer in-die overlay metrology: measurement and simulation at the edge of finiteness

Arie den Boef, Maurits van der Schaar, Kaustuve Bhattacharyya, 2013, Optical Metrology.

Scatterometry for advanced process control in semiconductor device manufacturing

Hugo Cramer, Arie den Boef, Eric Bakker, 2017, Other Conferences.

Advanced litho-cluster control via integrated in-chip metrology

Arie den Boef, Kaustuve Bhattacharyya, Chih-Ming Ke, 2013, ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference.

Enhancing the applications space of diffraction based overlay metrology by increasing throughput and target pitch flexibility

Chao Fang, Fei Jia, Arie den Boef, 2020, Advanced Lithography.

Improving on-product performance at litho using integrated diffraction-based metrology and computationally designed device-like targets fit for advanced technologies (incl. FinFET)

Reinder Plug, Pu Li, Arie den Boef, 2014, Advanced Lithography.

Large dynamic range Atomic Force Microscope for overlay improvements

Arie den Boef, Leon Levasier, Gert Witvoet, 2016, SPIE Advanced Lithography.

Intra-field patterning control using high-speed and small-target optical metrology of CD and focus

Bart Segers, Frank Staals, Hugo Cramer, 2015, Advanced Lithography.

Evaluation of a novel ultra small target technology supporting on-product overlay measurements

Arie den Boef, Maurits van der Schaar, Kaustuve Bhattacharyya, 2012, Advanced Lithography.

A complete methodology towards accuracy and lot-to-lot robustness in on-product overlay metrology using flexible wavelength selection

Vincent Couraudon, Arie den Boef, Kaustuve Bhattacharyya, 2017, Advanced Lithography.

A study of swing-curve physics in diffraction-based overlay

Chan Hwang, Seung Yoon Lee, Se-Ra Jeon, 2016, SPIE Advanced Lithography.

Color mixing in overlay metrology for greater accuracy and robustness

Arie den Boef, Kaustuve Bhattacharyya, John Lin, 2019, Advanced Lithography.

Taking the multi-wavelength DBO to the next level of accuracy and robustness

Chan Hwang, Seung Yoon Lee, Joonsoo Park, 2020, Advanced Lithography.

Holistic approach using accuracy of diffraction-based integrated metrology to improve on-product performance, reduce cycle time, and cost at litho

Vincent Couraudon, Arie den Boef, Youping Zhang, 2015, Advanced Lithography.

On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections

Arie den Boef, Maurits van der Schaar, Kaustuve Bhattacharyya, 2013, Advanced Lithography.

Multi-wavelength approach towards on-product overlay accuracy and robustness

Arie den Boef, Kaustuve Bhattacharyya, John Lin, 2018, Advanced Lithography.

A novel robust diffraction-based metrology concept for measurement and monitoring of critical layers in memory devices

Chan Hwang, Joo-Tae Moon, Cheol-Hong Kim, 2010, Advanced Lithography.

Fundamental understanding of the interplay between target and sensor brings diffraction based overlay to the next level of accuracy

Arie den Boef, Kaustuve Bhattacharyya, Simon G. Mathijssen, 2021 .