Hirotaka Kohno

Current status of water immersion lithography and prospect of higher index method

Martin McCallum, Yasuhiro Ohmura, Katsushi Nakano, 2007, European Mask and Lithography Conference.

Latest performance of immersion scanner S620D with the Streamlign platform for the double patterning generation

Yuichi Shibazaki, Yasuhiro Iriuchijima, Jun Ishikawa, 2010, Advanced Lithography.

Immersion and dry ArF scanners enabling 22nm HP production and beyond

Yuichi Shibazaki, Eiichiro Tanaka, Yusaku Uehara, 2012, Advanced Lithography.

Practical performance and enabling technologies in immersion scanners for the double patterning generation

Shinji Sato, Yuichi Shibazaki, Jun Ishikawa, 2011, Advanced Lithography.

An innovative platform for high-throughput high-accuracy lithography using a single wafer stage

Yuichi Shibazaki, Masato Hamatani, Hirotaka Kohno, 2009, Advanced Lithography.