Richard N. Watts

Soft x-ray reflectometry program at the national institute of standards and technology

Thomas B. Lucatorto, Charles S. Tarrio, Richard N. Watts, 1993, Optics & Photonics.

Fabrication of multilayer optics by sputtering: application to EUV optics with greater than 30% normal reflectance

Richard B. Hoover, Charles S. Tarrio, Richard N. Watts, 1995, Optics & Photonics.

XUV characterization comparison of Mo/Si multilayer coatings

David L. Windt, Warren K. Waskiewicz, Troy W. Barbee, 1991, Optics & Photonics.

Interfaces in Mo/Si multilayers

Charles M. Falco, Jon M. Slaughter, Patrick A. Kearney, 1991, Optics & Photonics.

Ultrahigh-resolution photographic films for x-ray/EUV/FUV astronomy

Craig E. Deforest, Arthur B. C. Walker, Richard B. Hoover, 1993, Optics & Photonics.

Improved reflectometry facility at the National Institute of Standards and Technology

Thomas B. Lucatorto, Charles S. Tarrio, Richard N. Watts, 1994, Optics & Photonics.

XUV polarimeter for undulator radiation measurements

Samuel D. Bader, Troy W. Barbee, P. J. Viccaro, 1991, Optics & Photonics.