Rei Seki

Control and reduction of immersion defectivity for yield enhancement at high volume production

Masato Yoshida, Soichi Owa, Yasuhiro Iriuchijima, 2009, Advanced Lithography.

Topcoat-less resist approach for high volume production and yield enhancement of immersion lithography

Soichi Owa, Yasuhiro Iriuchijima, Katsushi Nakano, 2010, Advanced Lithography.