Yuval Blumberg

Aerial-image-based off-focus inspection: lithography process window analysis during mask inspection

Anja Rosenbusch, Reuven Falah, Shirley Hemar, 2003, SPIE Photomask Technology.

Inspection of aggressive OPC using aerial image-based mask inspection

Anja Rosenbusch, Reuven Falah, Luke T. H. Hsu, 2003, Photomask Japan.

Process variation monitoring (PVM) by wafer inspection tool as a complementary method to CD-SEM for mapping LER and defect density on production wafers

Doron Meshulach, Shimon Levi, Kobi Kan, 2009, Advanced Lithography.