Sander de Putter

Advanced imaging with 1.35 NA immersion systems for volume production

Nils Dieckmann, Igor Bouchoms, Jan Mulkens, 2010, Advanced Lithography.

Reducing the impact of reticle CD-non-uniformity of multiple structures by dose corrections based on aerial image measurements

Jo Finders, Ute Buttgereit, Thomas Scheruebl, 2010, Advanced Lithography.