Pietro Cantu

Alternated phase-shift mask for 45nm node contact hole patterning

Alessandro Vaccaro, Gianfranco Capetti, Pietro Cantu, 2006, SPIE Advanced Lithography.

Device based evaluation of electron projection lithography

Tadahiko Takikawa, Martin McCallum, Hiroshi Fujita, 2005, SPIE Advanced Lithography.

Evaluation of Hitachi CAD to CD-SEM metrology package for OPC model tuning and product devices OPC verification

Robert Steffen, Gianfranco Capetti, Mauro Vasconi, 2005, SPIE Advanced Lithography.

Evaluation of IDEALSmile for 90-nm FLASH memory contact holes imaging with ArF scanner

Gianfranco Capetti, Kenji Yamazoe, Yasuo Hasegawa, 2004, SPIE Advanced Lithography.

LENS (lithography enhancement toward nano scale): a European project to support double exposure and double patterning technology development

Hiroyuki Miyashita, Olivier Toublan, Xavier Buch, 2010, Advanced Lithography.