Yuanting Cui

Fine tune W-CMP process with alignment mark selection for optimal metal layer overlay and yield benefits

Albert So, Sean Louks, Yuanting Cui, 2004, SPIE Advanced Lithography.

Segmented alignment mark optimization and signal strength enhancement for deep trench process

Richard van Haren, Frank Goodwin, Yuanting Cui, 2004, SPIE Advanced Lithography.

Advanced process control applied to metal layer overlay process

Christopher Gould, Sean Louks, Yuanting Cui, 2004, SPIE Advanced Lithography.

Fine-tune lens-heating-induced focus drift with different process and illumination settings

Yuanting Cui, 2001, SPIE Advanced Lithography.

Improving image control by correcting the lens-heating focus drift

Hsiang-Chung Liu, Yuanting Cui, Bwo-Jung Cheng, 2000, Advanced Lithography.

Inheritance scheme for cascading lithography process control parameters technology, layer, and tool

Christopher Gould, Yuanting Cui, Abeer Singhal, 2005, SPIE Advanced Lithography.