Hiroshi Ban

发表

Characteristics of a chemically amplified silicone-based negative resist in KrF excimer laser lithography

Akinobu Tanaka, Jiro Nakamura, Yoshio Kawai, 1992, Advanced Lithography.

Torsion-damer-added-flywheel

Akio Yoshida, Hiroshi Ban, Hidekazu Hori, 1977 .

EFFECT OF OVERCOATS ON ENVIRONMENTAL STABILITY OF A CHEMICALLY AMPLIFIED POSITIVE RESIST AGAINST WATER AND ORGANIC BASES

Akinobu Tanaka, Yoshio Kawai, Hiroshi Ban, 1995 .

Influence of Acid Diffusion on the Lithographic Performance of Chemically Amplified Resists

Akinobu Tanaka, Hiroshi Ban, Jiro Nakamura, 1992 .

Application of x‐ray lithography with a single‐layer resist process to subquartermicron large scale integrated circuit fabrication

Shinsuke Konaka, Hakaru Kyuragi, Tadahito Matsuda, 1992 .

EVALUATION OF ACID DIFFUSION IN CHEMICALLY AMPLIFIED RESIST USING INTERDIGITATED ARRAY ELECTRODE.

Akinobu Tanaka, Hiroshi Ban, Jiro Nakamura, 1993 .

Preparation of a Novel Silicone-Based Positive Photoresist and Its Application to an Image Reversal Process

Saburo Imamura, Akinobu Tanaka, Hiroshi Ban, 1989 .

Resist Surface Roughness Calculated using Theoretical Percolation Model.

Hiroshi Ban, Kimiyoshi Deguchi, H. Ban, 1998 .

Fabrication of 0.2 μm large scale integrated circuits using synchrotron radiation x‐ray lithography

Tadahito Matsuda, Y. Kado, Hiroshi Ban, 1995 .