Tomoyuki Chikanaga

New proximity effect correction for under 100nm patterns

Masahiro Shoji, Nobuyasu Horiuchi, Dai Tsunoda, 2006, SPIE Advanced Lithography.

Study of data I/O performance on distributed disk system in mask data preparation

Tomoyuki Chikanaga, Masakazu Hamaji, Shuichiro Ohara, 2010, Photomask Technology.

New proximity effect correction for under 100 nm patterns

Nobuyasu Horiuchi, Masahiro Shoji, Dai Tsunoda, 2006, Photomask Japan.