Lanny Mihardja

Data feed-forward for improved optical CD and film metrology

Qiang Zhao, John C. Robinson, Zhengquan Tan, 2012, Advanced Lithography.

Advanced gate CDU control in sub-28nm node using poly slot process by scatterometry metrology

Howard Chen, Sungchul Yoo, Chun-Chi Yu, 2013, Advanced Lithography.

Apply multiple target for advanced gate ADI critical dimension measurement by scatterometry technology

Howard Chen, Sungchul Yoo, Chun-Chi Yu, 2012, Advanced Lithography.