Houssam Chouaib

Data feed-forward for improved optical CD and film metrology

Qiang Zhao, John C. Robinson, Zhengquan Tan, 2012, Advanced Lithography.

Tracking the defects of ultra-thin HfO2 using a Cody-Lorentz multiple oscillator model

Zhengquan Tan, Dawei Hu, Houssam Chouaib, 2018, Advanced Lithography.

Fast and accurate scatterometry metrology method for STI CMP step height process evaluation

Chih-Hsun Lin, Chia-Lin Hsu, Houssam Chouaib, 2012, Advanced Lithography.

Apply multiple target for advanced gate ADI critical dimension measurement by scatterometry technology

Howard Chen, Sungchul Yoo, Chun-Chi Yu, 2012, Advanced Lithography.

Recess gate process control by using 3D SCD in 3xm vertical DRAM

Sheng-Hung Wu, Qiang Zhao, Elvis Wang, 2012, Advanced Lithography.

Nanoscale optical critical dimension measurement of a contact hole using deep ultraviolet spectroscopic ellipsometry

Qiang Zhao, Houssam Chouaib, 2013 .