Sung-woo Ko

The study of contact hole for 65nm node with KrF

Donggyu Yim, Yeong-Bae Ahn, Byung-Ho Nam, 2006, Photomask Japan.

Model-based pattern dummy generation for logic devices

Donggyu Yim, Hyunjo Yang, Cheol-Kyun Kim, 2014, Advanced Lithography.

OPC model accuracy study using high volume contour based gauges and deep learning on memory device

Meng Liu, Lei Wang, Young-Seok Kim, 2019, Advanced Lithography.

Process window improvement in the 2xnm-node DRAM contact hole using full-chip level model-based assist feature technology

Donggyu Yim, Sungki Park, Wei Si, 2011 .

Evaluation of inverse lithography technology for 55nm-node memory device

Ki-Ho Baik, Ying Cui, Donggyu Yim, 2008, SPIE Advanced Lithography.