Yosef Avrahamov

Overlay measurement accuracy verification using CD-SEM and application to the quantification of WIS caused by BARC

Philippe Thony, Elyakim Kassel, Marco Polli, 2005, SPIE Advanced Lithography.

AIM technology for nonvolatile memories microelectronics devices

Elyakim Kassel, Pavel Izikson, Marco Polli, 2006, SPIE Advanced Lithography.

Photoresist qualification using scatterometry CD

Wenyan Yin, Yosef Avrahamov, Guy Cohen, 2012, Advanced Lithography.

Lithography rework reduction and improved process control using AIM targets on aluminum layers in the high-volume production of 110-nm DRAM devices

Detlef Hofmann, Christian Sparka, Frank Rabe, 2006, SPIE Advanced Lithography.

45nm design rule in-die overlay metrology on immersion lithography processes

Chien-Jen Huang, Chin-Chou Kevin Huang, Mike Adel, 2007, SPIE Advanced Lithography.

Automated overlay recipe setup in high-volume manufacturing: improving performance, efficiency, and robustness

David Tien, Christian Sparka, Anna Golotsvan, 2009, Advanced Lithography.