G. McIntyre

Design Considerations for the Mechanical Tuner of the RHIC Electron Cooler SRF Cavity

J. Rank, I. Ben-Zvi, M. Blaskiewicz, 2005, Proceedings of the 2005 Particle Accelerator Conference.

Impact of a SADP flow on the design and process for N10/N7 metal layers

Diederik Verkest, Kurt G. Ronse, Julien Ryckaert, 2015, Advanced Lithography.

Single exposure EUV of 32nm pitch logic structures: patterning performance on BF and DF masks

E. Hendrickx, M. Kupers, J. Bekaert, 2018, Advanced Lithography.

Single exposure EUV patterning of BEOL metal layers on the IMEC iN7 platform

E. Hendrickx, F. Wittebrood, A. Mallik, 2017, Advanced Lithography.

Metal stack optimization for low-power and high-density for N7-N5

Diederik Verkest, Kurt G. Ronse, Mircea Dusa, 2016, SPIE Advanced Lithography.