Nicolas Nagel

FeRAM technology for high density applications

Walter Hartner, Thomas Mikolajick, Manfred Moert, 2001, Microelectron. Reliab..

Charge cross talk in sub-lithographically shrinked 32 nm Twin Flash™ memory cells

K.-H. Kusters, Thomas Mikolajick, Christoph Ludwig, 2008 .

FeRAM technology: Today and future

Iwao Kunishima, Nicolas Nagel, 2003 .

New Materials in Memory Development Sub 50 nm: Trends in Flash and DRAM

Uwe Schroeder, Dirk Manger, Christoph Ludwig, 2009 .