Jack Strand

Correlated Defect Creation in HfO2 films

Alexander Shluger, Jack Strand, A. Shluger, 2018, 2018 International Integrated Reliability Workshop (IIRW).

Role of electron and hole injection in electroforming of SiO2 and HfO2 based RRAM cells

Anthony J. Kenyon, Alexander L. Shluger, Adnan Mehonic, 2017 .

Role of electron and hole trapping in the degradation and breakdown of SiO2 and HfO2 films

Luca Larcher, Alexander L. Shluger, Andrea Padovani, 2018, 2018 IEEE International Reliability Physics Symposium (IRPS).

First principles calculations of optical properties for oxygen vacancies in binary metal oxides.

Jack Strand, A. Shluger, S. Chulkov, 2019, The Journal of chemical physics.

Deep electron and hole polarons and bipolarons in amorphous oxide

Alexander L. Shluger, Valery V. Afanas'ev, Jack Strand, 2016 .