Joseph Lachowski

Sub-0.25-μm i-line photoresist: the role of advanced resin technology

Cheng-Bai Xu, Anthony Zampini, Harold F. Sandford, 1999, Advanced Lithography.

Development of DUV resists for zero angle and angled implant applications

Michael F. Cronin, Jacque H. Georger, Joseph Lachowski, 2001, SPIE Advanced Lithography.