Kandabara Tapily

Self-aligned quadruple patterning using spacer on spacer integration optimization for N5

Angélique Raley, Akiteru Ko, Peter Biolsi, 2017, Advanced Lithography.

Self-aligned quadruple patterning integration using spacer on spacer pitch splitting at the resist level for sub-32nm pitch applications

Angélique Raley, Akiteru Ko, Peter Biolsi, 2016, SPIE Advanced Lithography.

Material Innovation in the Era of Artificial Intelligence - A Case Study of Hf-Zr Systems

Robert D. Clark, Dina H. Triyoso, Gert Leusink, 2020, 2020 4th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).