Denis Bolshukhin

Performance and lifetime of EUV source collectors measured with a full size EUV collector reflectometer

Boris N. Chichkov, Torsten Feigl, Ulf Hinze, 2008, SPIE Advanced Lithography.

High-power EUV lithography sources based on gas discharges and laser-produced plasmas

Uwe Stamm, Denis Bolshukhin, Guido Schriever, 2003, SPIE Advanced Lithography.

Thermal management design and verification of collector optics into high-power EUV source systems

Denis Bolshukhin, Giovanni Bianucci, Giorgio Pirovano, 2007, SPIE Advanced Lithography.

Xenon DPP source technologies for EUVL exposure tools

Denis Bolshukhin, Jürgen Kleinschmidt, Guido Schriever, 2009, Advanced Lithography.

High-power sources for EUV lithography: state of the art

Uwe Stamm, Denis Bolshukhin, Guido Schriever, 2004, SPIE High-Power Laser Ablation.

Progress on Xe-DPP source development for alpha phase

Denis Bolshukhin, Jürgen Kleinschmidt, Guido Schriever, 2008, SPIE Advanced Lithography.

EUV source power and lifetime: the most critical issues for EUV lithography

Uwe Stamm, Denis Bolshukhin, Guido Schriever, 2004, SPIE Advanced Lithography.