Ines Anke

Simulation-based proximity correction in high-volume DRAM production

Joerg Thiele, Werner Fischer, Ines Anke, 2000, Advanced Lithography.

Replication of micro-optical profiles in ORMOCER and other polymers

Ernst-Bernhard Kley, Bernd Schnabel, Ruediger Poehlmann, 1996, Other Conferences.

A process for producing an exposure mask and method for optimizing a simulation method

Joerg Thiele, Werner Fischer, Armin Semmler, 2001 .

Improved manufacturability by OPC based on defocus data

Armin Semmler, Henning Haffner, Ines Anke, 2003, SPIE Advanced Lithography.