Toi Yue Becky Leung

Photomask etch: addressing the resist challenges for advanced phase-shift and binary photomasks

Ajay Kumar, Madhavi Chandrachood, Amitabh Sabharwal, 2012, Photomask Technology.

Quartz etch solutions for 45-nm phase-shift masks

Ajay Kumar, Ibrahim M. Ibrahim, Sheeba J. Panayil, 2006, SPIE Photomask Technology.

Overcoming loading challenges in a mask etcher for 45 nm and beyond

Ajay Kumar, Ibrahim M. Ibrahim, Sheeba J. Panayil, 2007 .

Quartz etch challenges for 45 nm phase-shift masks

Ajay Kumar, Scott Alan Anderson, Ibrahim M. Ibrahim, 2006, Photomask Japan.

Dry etching performance of advanced EUV mask blanks

Richard Wistrom, Emily Gallagher, Tom Faure, 2011, Photomask Technology.

Overcoming mask etch challenges for 45 nm and beyond

Ajay Kumar, Ibrahim M. Ibrahim, Sheeba J. Panayil, 2008, European Mask and Lithography Conference.