Pierre Fanton

Resist coating optimization on 8-in. deep-UV litho cell: modeling and application to 0.25-μm technology

Daniel Boutin, Andrew A. Blash, Jean Pierre Caire, 1995, Advanced Lithography.

Optimization of CD control in DUV positive resists: influence of photoresist viscoelastic properties on PEB conditions

Pierre Fanton, Francoise Vinet, Laurent Pain, 1995, Advanced Lithography.

EDMES: an expert system for process optimization in microlithography

Dominique Poncet, Pierre Fanton, Francoise Vinet, 1994 .