D. L. White

发表

Phase-mask effects by dark-field lithography

D. L. White, Raymond A. Cirelli, Steven J. Spector, 2000, Advanced Lithography.

Rapid at-wavelength inspection of EUV mask blanks by photoresist transfer

Ping Luo, D. L. White, Steven J. Spector, 1998, Photomask Technology.

New Generation Of Frac Fluids

D. L. White, R. B. Rosene, A. R. Hendrickson, 1973 .

Development of a technique for rapid at-wavelength inspection of EUV mask blanks

Ping Luo, D. L. White, Steven J. Spector, 1999, Advanced Lithography.

Characterization of an expanded‐field Schwarzschild objective for extreme ultraviolet lithography

Richard H. Stulen, Michael E. Malinowski, David L. Windt, 1994 .

Diffraction-limited soft x-ray projection lithography with a laser plasma source

Richard H. Stulen, Michael E. Malinowski, David L. Windt, 1991 .

Technique for rapid at-wavelength inspection of extreme ultraviolet mask blanks

D. L. White, Donald M. Tennant, O. R. Wood, 1999 .

Reflective mask technologies and imaging results in soft x‐ray projection lithography

David L. Windt, D. L. White, L. Eichner, 1991 .

Reduction imaging at 14 nm using multilayer‐coated optics: Printing of features smaller than 0.1 μm

David L. Windt, Jeffrey Bokor, D. L. White, 1990 .

Spatial frequency doubling lithography (SFDL) of periodic structures for integrated optical circuit technology

D. L. White, T. E. Jewell, 1989 .

Lithographic projectors with dark-field illumination

D. L. White, Raymond A. Cirelli, O. R. Wood, 1999 .

Amplification of Ultrasonic Waves in Piezoelectric Semiconductors

D. L. White, 1962 .

The interference fringe aligner

D. L. White, P. Gunter, D. White, 1988 .

Ultrasonic Amplification in CdS

D. L. White, A. R. Hutson, D. White, 1961 .

Use of attenuated phase masks in extreme ultraviolet lithography

D. L. White, A. A. MacDowell, Donald M. Tennant, 1997 .