Satoshi Tanaka

发表

Reticle SEM specifications required for lithography simulation

Masamitsu Itoh, Takahiro Ikeda, Mitsuyo Kariya, 2005, Photomask Japan.

Hot spot management in ultra-low k1 lithography

Eiji Yamanaka, Soichi Inoue, Kohji Hashimoto, 2006, SPIE Advanced Lithography.

Study of recent CFD-based scheme for analyzing 3D mask effects

Shigeki Nojima, Shoji Mimotogi, Masanori Takahashi, 2013, Advanced Lithography.

DFM for defect-free DSA hole shrink process

Shoji Mimotogi, Shimon Maeda, Satoshi Tanaka, 2014, Advanced Lithography.

Study of practical TAT reduction approaches for EUV flare correction

Toshiya Kotani, Ryoichi Inanami, Suigen Kyoh, 2010, Advanced Lithography.

Statistical approach utilizing neural networks for CD error prediction

Shoji Mimotogi, Masaki Satake, Satoshi Tanaka, 2007, SPIE Advanced Lithography.

Enhanced flexible mask specifications

Kohji Hashimoto, Osamu Ikenaga, Soichi Inoue, 2003, Photomask Japan.

Hierarchical processing for accurate optical proximity correction for 1-Gb DRAM metal layers

Soichi Inoue, Toshiya Kotani, Satoshi Tanaka, 1999, Advanced Lithography.

A coding scheme for field-powered RF IC tag systems

Satoshi Tanaka, Tomoaki Ishifuji, T. Saito, 1998, 1998 Symposium on VLSI Circuits. Digest of Technical Papers (Cat. No.98CH36215).

Design intent application to tolerance-based manufacturing system

Soichi Inoue, Koji Nakamae, Sachiko Kobayashi, 2011 .

Novel error mode analysis method for graphoepitaxial directed self-assembly lithography based on the dissipative particle dynamics method

Shoji Mimotogi, Shimon Maeda, Satoshi Tanaka, 2013, Advanced Lithography.

Advanced hybrid optical proximity correction system with OPC segment library and model-based correction module

Soichi Inoue, Hirotaka Ichikawa, Toshiya Kotani, 2002, SPIE Advanced Lithography.

A photomask defect evaluation system

Eiji Yamanaka, Osamu Ikenaga, Takahiro Ikeda, 2004, Photomask Japan.

Hotspot detection using image pattern recognition based on higher-order local auto-correlation

Soichi Inoue, Hirotaka Ichikawa, Toshiya Kotani, 2011, Advanced Lithography.

Phase-contrast lithography

Soichi Inoue, Tadahito Fujisawa, Satoshi Tanaka, 1993, Advanced Lithography.

Availability study of CFD-based Mask3D simulation method for next generation lithography technologies

Shoji Mimotogi, Masanori Takahashi, Satoshi Tanaka, 2014, Advanced Lithography.

New process proximity correction using neural network in spacer patterning technology

Soichi Inoue, Toshiya Kotani, Satoshi Tanaka, 2009, Advanced Lithography.

Efficient hybrid optical proximity correction method based on the flow of design for manufacturability (DfM)

Soichi Inoue, Hirotaka Ichikawa, Toshiya Kotani, 2003, Photomask Japan.

Impact of OPC aggressiveness on mask maufacturability

Soichi Inoue, Toshiya Kotani, Ichiro Mori, 2003, Photomask Japan.

Development of an Ultrahigh Speed Robot FALCON Using Parallel Wire Drive Systems

Sadao Kawamura, Hitoshi Kino, Satoshi Tanaka, 1997 .

Automated hot-spot fixing system applied for metal layers of 65 nm logic devices

Soichi Inoue, Toshiya Kotani, Suigen Kyoh, 2006, Photomask Japan.

Evaluation of lithography simulation model accuracy for hotspot-based mask quality assurance

Kohji Hashimoto, Soichi Inoue, Masaki Satake, 2007, Photomask Japan.

Automated hot-spot fixing system applied to the metal layers of 65-nm logic devices

Soichi Inoue, Toshiya Kotani, Suigen Kyoh, 2007 .

Robust PPC and DFM methodology for exposure tool variations

Soichi Inoue, Toshiya Kotani, Satoshi Tanaka, 2008, SPIE Advanced Lithography.

Alignment mark signal simulation system for the optimum mark feature selection

Takashi Sakamoto, Takashi Sato, Satoshi Tanaka, 2004, SPIE Advanced Lithography.

Hotspot management in which mask fabrication errors are considered

Eiji Yamanaka, Masaki Satake, Mitsuyo Kariya, 2008, Photomask Japan.

Hotspot management and its applications in ultralow k1 lithography

Eiji Yamanaka, Soichi Inoue, Kohji Hashimoto, 2009 .

Mask pattern quality assurance based on lithography simulation with fine pixel SEM image

Eiji Yamanaka, Kohji Hashimoto, Masamitsu Itoh, 2005, SPIE Photomask Technology.

Alignment mark signal simulation system for the optimum mark feature selection

Takashi Sakamoto, Satoshi Tanaka, Kazutaka Ishigo, 2005 .

Scanner fleet management utilizing programmed hotspot patterns

Eiji Yamanaka, Hiroyuki Morinaga, Soichi Inoue, 2008, Photomask Japan.

Prediction of imaging performance of immersion lithography using high refractive index fluid

Shoji Mimotogi, Masamitsu Itoh, Takashi Sato, 2008, SPIE Advanced Lithography.

Lithography simulation system for total CD control from design to manufacturing

Soichi Inoue, Hirotaka Ichikawa, Toshiya Kotani, 2005, SPIE Advanced Lithography.

Novel fine-tuned model-based SRAF generation method using coherence map

Soichi Inoue, Chikaaki Kodama, Toshiya Kotani, 2010, Advanced Lithography.

Fine pixel SEM image for mask pattern quality assurance based on lithography simulation

Shinji Yamaguchi, Eiji Yamanaka, Kohji Hashimoto, 2006, Photomask Japan.

Ultimately accurate SRAF replacement for practical phases using an adaptive search algorithm based on the optimal gradient method

Soichi Inoue, Shigeki Nojima, Tetsuaki Matsunawa, 2010, Advanced Lithography.

Tool-induced hotspot fixing flow for high volume products

Kohji Hashimoto, Soichi Inoue, Toshiya Kotani, 2008, Photomask Japan.

Lithography compliance check considering neighboring cell structures for robust cell design

Shigeki Nojima, Shimon Maeda, Satoshi Tanaka, 2009, Photomask Japan.

Validation of process cost effective layout refinement utilizing design intent

Soichi Inoue, Toshiya Kotani, Sachiko Kobayashi, 2011, Advanced Lithography.

Yield-aware decomposition for LELE double patterning

Chikaaki Kodama, Shigeki Nojima, Atsushi Takahashi, 2014, Advanced Lithography.

Design intention application to tolerance-based manufacturing system

Soichi Inoue, Koji Nakamae, Sachiko Kobayashi, 2010, Advanced Lithography.

Practical topography design for alternating phase-shifting mask

Soichi Inoue, Kenji Kawano, Satoshi Tanaka, 1996, Advanced Lithography.

Sampling plan optimization for CD control in low k1 lithography

Hideaki Abe, Shoji Mimotogi, Masafumi Asano, 2005, SPIE Advanced Lithography.

A novel fast 3D resist simulation method using Chebyshev expansion

Soichi Inoue, Shoji Mimotogi, Satoshi Tanaka, 2009, Advanced Lithography.

Yield-aware mask assignment by positive semidefinite relaxation in triple patterning using cut process

Chikaaki Kodama, Shigeki Nojima, Atsushi Takahashi, 2016 .

Yield-enhanced layout generation by new design for manufacturability (DfM) flow

Soichi Inoue, Toshiya Kotani, Shigeki Nojima, 2004, SPIE Advanced Lithography.

Automatic optical proximity correction with optimization of stepper condition

Soichi Inoue, Shoji Mimotogi, Tadahito Fujisawa, 1995, Advanced Lithography.

Localization concept of re-decomposition area to fix hotspots for LELE process

Chikaaki Kodama, Shigeki Nojima, Atsushi Takahashi, 2014, Advanced Lithography.

Impact of patterning strategy on mask fabrication beyond 32nm

Soichi Inoue, Shoji Mimotogi, Masafumi Asano, 2008, Photomask Japan.

Yield-aware mask assignment using positive semi-definite relaxation in LELECUT triple patterning

Chikaaki Kodama, Shigeki Nojima, Atsushi Takahashi, 2015, Advanced Lithography.

Tolerance-Based Wafer Verification Methodologies with a Die-to-Database Inspection System

Soichi Inoue, Kohji Hashimoto, Toshiya Kotani, 2009 .

Management of pattern generation system based on i-line stepper

Soichi Inoue, Katsuya Okumura, Yuuki Ishii, 2001, SPIE Photomask Technology.

Structural changes of embedded economical time series

Ikuo Matsuba, Satoshi Tanaka, Linyuan Wang, 1998 .

Optimal setting strategy for kernel-based OPC simulation engines

Soichi Inoue, Toshiya Kotani, Satoshi Tanaka, 2009, Advanced Lithography.

Tandem process proximity correction method

Kohji Hashimoto, Soichi Inoue, Toshiya Kotani, 2002, SPIE Advanced Lithography.

Generator of predictive verification pattern using vision system based on higher-order local autocorrelation

Hirotaka Ichikawa, Shigeki Nojima, Shoji Mimotogi, 2012, Advanced Lithography.