Remco Groenendijk

Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control

Jo Finders, Timon Fliervoet, Mireille Maenhoudt, 2009, Advanced Lithography.

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Scott Halle, Bernhard Kneer, Emily Gallagher, 2009, Advanced Lithography.

Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator

Scott Halle, Richard Johnson, Hirokazu Kato, 2011, Advanced Lithography.