Paul Mertens

发表

Just Clean Enough Technology for the 21st Century

Marc Heyns, Harald Schmidt, Marc Meuris, 1995 .

The IMEC Clean Concept : An Advanced Wafer Cleaning Technology

Marc Heyns, Marc Meuris, Ara Philipossian, 1994 .

Ultra clean processing of silicon surfaces 2000 : proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2000), held in Ostend, Belgium, September 18-20, 2000

Marc Heyns, Marc Meuris, Paul Mertens, 2001 .

Single-wafer wet cleaning improved by novel high-performance wafer drying

Katrien Marent, Paul Mertens, 2000 .

Pattern Collapse-related Issues and Their Solutions

Paul Mertens, 2017 .

Advanced wet and dry cleaning coming together for next generation

Marc Heyns, Jerzy Ruzyllo, Paul Mertens, 1999 .

Monitoring and qualification using comprehensive surface haze information

Karine Kenis, Frank Holsteyns, Paul Mertens, 2003 .

Wear-out of ultra-thin gate oxides during high-field electron tunnelling

Marc Heyns, Marc Meuris, Bert Vermeire, 1995 .

Evaluation of Megasonic Cleaning for Sub-90nm Technologies

Guy Vereecke, Karine Kenis, Frank Holsteyns, 2005 .

Use of a Purged FOUP to Improve H-Terminated Silicon Surface Stability Prior to Epitaxial Growth

Stefan De Gendt, Roger Loo, Andriy Hikavyy, 2014 .

Evaluation of Time‐of‐Flight Secondary Ion Mass Spectrometry for Metal Contamination Monitoring on Si Wafer Surfaces

Wilfried Vandervorst, S. De Gendt, Renaat Gijbels, 2000 .

Relation between stress-induced leakage current and time-dependent dielectric breakdown in ultra-thin gate oxides

Marc Heyns, Michel Houssa, Paul Mertens, 1999 .

Removal of Small (<100-nm) Particles and Metal Contamination in Single-Wafer Cleaning Tool

Kazuo Nakajima, Marc Heyns, Rita Vos, 2003 .

High Speed Imaging of 1 MHz Driven Microbubbles in Contact with a Rigid Wall

Detlef Lohse, Kurt Wostyn, Michel Versluis, 2009 .

Model for the current–voltage characteristics of ultrathin gate oxides after soft breakdown

Tanya Nigam, Marc Heyns, Michel Houssa, 1998 .

Defectivity Study of Cu Metallization Process by Dark- and Bright-Field Inspection

Karen Maex, Frank Holsteyns, Paul Mertens, 2003 .

The IMEC clean : A new concept for particle and metal removal on Si surfaces

Marc Heyns, Marc Meuris, Guy Vereecke, 1995 .

Surface Passivation for Si Solar Cells: A Combination of Advanced Surface Cleaning and Thermal Atomic Layer Deposition of Al2O3

Robert Mertens, Jef Poortmans, Bart Vermang, 2012 .

Megasonics: A Cavitation Driven Process

Guy Vereecke, Frank Holsteyns, Paul Mertens, 2005 .

Soft breakdown in ultrathin gate oxides: Correlation with the percolation theory of nonlinear conductors

Tanya Nigam, Marc Heyns, Michel Houssa, 1998 .

Relation between Particle Density and Haze on a Wafer: a New Approach to Measuring Nano-Sized Particles

Marc Heyns, Guy Vereecke, Karine Kenis, 2003 .

Removal of Nano-Particles by Aerosol Spray: Effect of Droplet Size and Velocity on Cleaning Performance

Kurt Wostyn, Michael Dalmer, Paul Mertens, 2009 .

(Invited) Selective Etch of Si and SiGe for Gate All-Around Device Architecture

Naoto Horiguchi, Liesbeth Witters, Aaron Thean, 2015 .

Optimizing high frequency ultrasound cleaning in the semiconductor industry

Stefan De Gendt, Marc Hauptmann, Herbert Struyf, 2012, CAV 2012.

Investigating techniques to improve gate-oxide integrity

Marc Heyns, Marc Meuris, Ara Philipossian, 1992 .

Effect of extreme surface roughness on the electrical characteristics of ultra-thin gate oxides

Tanya Nigam, Marc Heyns, Michel Houssa, 1999 .

Breakdown and Recovery of Thin Gate Oxides

Marc Heyns, Hans Wallinga, Pierre H. Woerlee, 2000 .

Cleaning and Surface Preparation for SiGe and Ge Channel Device

Rita Vos, Hiroaki Takahashi, Paul Mertens, 2012 .