Klaus-Dieter Roeth

发表

Advanced mask-to-mask overlay analysis for next generation technology node reticles

Klaus-Dieter Roeth, Frank Laske, Karl-Heinrich Schmidt, 2010, Photomask Japan.

New directions in image placement metrology

Klaus-Dieter Roeth, Frank Laske, Dieter Adam, 2011, European Mask and Lithography Conference.

Improving submicron CD measurements through optimum operating points

Klaus-Dieter Roeth, Mircea V. Dusa, Christoph Jung, 1991, Other Conferences.

Matching of different pattern placement metrology systems: an example for practical use of different LMS systems in the inspection process for photomasks

Klaus-Dieter Roeth, Thomas Struck, 1999, Advanced Lithography.

Pellicle-induced distortions on photomasks

Klaus-Dieter Roeth, Thomas Struck, 1998, Photomask and Next Generation Lithography Mask Technology.

In-die registration metrology on future-generation reticles

Klaus-Dieter Roeth, Frank Laske, Dieter Adam, 2009, Advanced Lithography.

First performance data obtained on next-generation optical mask metrology tools

Klaus-Dieter Roeth, Carola Blaesing-Bangert, Herger Alt, 2001, Photomask Japan.

Pattern placement metrology tool matching within DPI's sites

Klaus-Dieter Roeth, Norbert Talene, 1999, European Mask and Lithography Conference.

Next-generation mask metrology tool

Klaus-Dieter Roeth, Carola Blaesing-Bangert, Gerhard Schlueter, 2002, Photomask Japan.

Fast local registration measurements for efficient e-beam writer qualification and correction: EMLC18 Best Paper (Conference Presentation)

Klaus-Dieter Roeth, Frank Laske, Oliver Ache, 2018 .

Performance evaluation results on 2Xnm node enabler for mask registration metrology

Klaus-Dieter Roeth, Frank Laske, Dieter Adam, 2010, Photomask Technology.

Update on next generation metrology tool for DPL reticles

Klaus-Dieter Roeth, Frank Laske, Dieter Adam, 2010, European Mask and Lithography Conference.

Fast local registration measurements for efficient e-beam writer qualification and correction

Klaus-Dieter Roeth, Frank Laske, Oliver Ache, 2018, European Mask and Lithography Conference.

Effect of operating points in submicron CD measurements

Klaus-Dieter Roeth, Paul Jung, Mircea V. Dusa, 1991, Other Conferences.

Performance data obtained on a next-generation mask metrology tool

Klaus-Dieter Roeth, Carola Blaesing-Bangert, 1996, Advanced Lithography.

Using the Leitz LMS 2000 for monitoring and improvement of an e-beam

Klaus-Dieter Roeth, Carola Blaesing-Bangert, Yoichi Ogawa, 1994, Photomask and Next Generation Lithography Mask Technology.

45nm node registration metrology on LTEM EUV reticles

Klaus-Dieter Roeth, Frank Laske, Karl-Heinrich Schmidt, 2008, European Mask and Lithography Conference.

Metrology on phase-shift masks

Klaus-Dieter Roeth, Carola Blaesing-Bangert, Wilhelm Maurer, 1992, Advanced Lithography.

Performance data obtained on a new mask metrology tool

Klaus-Dieter Roeth, Carola Blaesing-Bangert, John M. Whittey, 1996, Photomask Technology.

In-die registration measurement using novel model-based approach for advanced technology masks

Shinji Kunitani, Klaus-Dieter Roeth, Frank Laske, 2014, Photomask and Next Generation Lithography Mask Technology.

In-die mask registration metrology for 32nm node DPT lithography

Klaus-Dieter Roeth, Frank Laske, Dieter Adam, 2009, Photomask Japan.

First performance data obtained on next-generation mask metrology tool

Klaus-Dieter Roeth, John M. Whittey, Gerhard W.B. Schlueter, 2002, SPIE Photomask Technology.

Investigation of local registration performance of IMS Nanofabrication’s Multi-Beam Mask Writer

Klaus-Dieter Roeth, Frank Laske, Mehdi Daneshpanah, 2015, Other Conferences.

Actual performance data obtained on new transmitted light mask metrology system

Klaus-Dieter Roeth, Gerhard W.B. Schlueter, 2002, European Mask and Lithography Conference.

Improving registration measurement capability by defining a 2D grid standard using multiple registration measurement tools

Klaus-Dieter Roeth, Frank Laske, Dieter Adam, 2010, Photomask Technology.

Changing technology requirements of mask metrology

Klaus-Dieter Roeth, Frank Laske, Mark Wagner, 2013, Other Conferences.

In-Die registration metrology: design data preparation solution

Klaus-Dieter Roeth, Frank Laske, Dieter Adam, 2010, Photomask Technology.

Enabling accurate and cost-effective registration metrology on EUVL masks

Klaus-Dieter Roeth, Frank Laske, Hendrik Steigerwald, 2018, Photomask Japan.

Registration measurement capability of VISTEC LMS IPRO4 with focus on small features

Klaus-Dieter Roeth, Frank Laske, Dieter Adam, 2008, Photomask Japan.