William L. Krisa

0.25-μm multilevel interconnect with DUV processing

William L. Krisa, Sonya Yvette Shaw, Ken Brennan, 1997, Advanced Lithography.

Investigating positive DUV resist profile on TiN

William L. Krisa, Qizhi He, Wei W. Lee, 1997, Advanced Lithography.

Application of deep-UV resist for 0.25-um metal and poly processing

William L. Krisa, Ken Brennan, Christopher J. Progler, 1996, Advanced Lithography.

Process optimization for 0.35-um i-line lithography

Cesar M. Garza, William L. Krisa, Anthony Yen, 1994, Advanced Lithography.

Contact performance with an attenuated phase shift reticle and variable partial coherence

Cesar M. Garza, William L. Krisa, Robert D. Bennett, 1995, Advanced Lithography.

0.35-um i-line poly processing with a bottom antireflective coating (BARC)

Cesar M. Garza, William L. Krisa, J. A. McKee, 1995, Advanced Lithography.

I-line photoresist evaluations for contact hole performance with attenuated phase-shift reticles

Cesar M. Garza, William L. Krisa, Anthony Yen, 1994, Advanced Lithography.