Akinobu Tanaka

发表

A New Silicone-Based Positive Photoresist (SPP) For A Two-Layer Resist System

Saburo Imamura, Akinobu Tanaka, Katsuhide Onose, 1988, Advanced Lithography.

New spatial frequency doubling method for sub-0.15-um optical lithography

Akinobu Tanaka, Akihiro Otaka, Yoshio Kawai, 1995, Advanced Lithography.

Characteristics of a chemically amplified silicone-based negative resist in KrF excimer laser lithography

Akinobu Tanaka, Jiro Nakamura, Yoshio Kawai, 1992, Advanced Lithography.

Sub-half-micron Patterning Characteristics of Silicone-based Positive (SPP) and Negative (SNP) Resists in KrF Excimer Laser Lithography

Akinobu Tanaka, Yoshio Kawai, Akira Yoshikawa, 1989, Advanced Lithography.

A Multi-Teacher Learning Automata Resolution of Cooperative Pursuit Problems

Fei Qian, Akinobu Tanaka, Hironiri Hirata, 2001 .

A Distributed Network Routing Algorithm using Reinforcement Learning Method

Fei Qian, Akinobu Tanaka, Hiroyuki Une, 2002 .

A Multi-Teacher Learning Automata Solution of Cooperative Pursuit Problems

Fei Qian, Hironori Hirata, Akinobu Tanaka, 2000 .

EFFECT OF OVERCOATS ON ENVIRONMENTAL STABILITY OF A CHEMICALLY AMPLIFIED POSITIVE RESIST AGAINST WATER AND ORGANIC BASES

Akinobu Tanaka, Yoshio Kawai, Hiroshi Ban, 1995 .

Influence of Acid Diffusion on the Lithographic Performance of Chemically Amplified Resists

Akinobu Tanaka, Hiroshi Ban, Jiro Nakamura, 1992 .

New Photoresist for High Resolution Two-Layer Resist Systems

Akinobu Tanaka, Katsuhide Onose, A. Tanaka, 1985 .

EVALUATION OF ACID DIFFUSION IN CHEMICALLY AMPLIFIED RESIST USING INTERDIGITATED ARRAY ELECTRODE.

Akinobu Tanaka, Hiroshi Ban, Jiro Nakamura, 1993 .

Preparation of a Novel Silicone-Based Positive Photoresist and Its Application to an Image Reversal Process

Saburo Imamura, Akinobu Tanaka, Hiroshi Ban, 1989 .

The effect of an organic base in chemically amplified resist on patterning characteristics using KrF lithography

Akinobu Tanaka, Akihiro Otaka, Yoshio Kawai, 1994 .