Patrick O'Keeffe

Production-ready 4-kHz ArF laser for 193-nm lithography

Choonghoon Oh, Vladimir B. Fleurov, Thomas Hofmann, 2002, SPIE Advanced Lithography.

Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography

Vladimir B. Fleurov, Daniel J. W. Brown, Fedor Trintchouk, 2003, SPIE Advanced Lithography.

Long-term reliable operation of a MOPA-based ArF light source for microlithography

Vladimir B. Fleurov, Toshihiko Ishihara, Walter D. Gillespie, 2004, SPIE Advanced Lithography.

A Sense of Belonging: Improving Student Retention.

Patrick O'Keeffe, P. O’Keeffe, 2013 .