MaryAnn Piasecki

Migrating deep-UV lithography to the 0.25-um regime: issues and outlook

Kevin J. Orvek, Sasha K. Dass, Len Gruber, 1996, Advanced Lithography.

Characterization of positive DUV resists at 0.25-μm polygate using organic and inorganic antireflection schemes

Kevin J. Orvek, Sasha K. Dass, Len Gruber, 1997, Advanced Lithography.

Comparison of I-line and deep-UV technologies for 0.35-um lithography

Daniel A. Corliss, James R. Buchanan, Joseph J. Ferrari, 1994, Advanced Lithography.