Ian D. Fink

Migrating deep-UV lithography to the 0.25-um regime: issues and outlook

Kevin J. Orvek, Sasha K. Dass, Len Gruber, 1996, Advanced Lithography.

Overlay sample plan optimization for the detection of higher order contributions to misalignment

James S. Lekas, Neal T. Sullivan, Ian D. Fink, 1994 .