Dong-Hoon Chung

EUV mask pattern inspection for memory mask fabrication in 45-nm node and below

Do-Young Kim, Seong Yong Cho, Hun Kim, 2006, SPIE Photomask Technology.

Performance of novel 198.5-nm wavelength mask inspection system for 65-nm node and beyond optical lithography era

Nobuyuki Yoshioka, Kenichi Matsumura, Toru Tojo, 2004, SPIE Photomask Technology.

Practical application of aerial imaging mask inspection for memory devices

Yong-Hoon Kim, Shmoolik Mangan, Eun Young Park, 2008, Photomask Japan.

Optical mask inspection strategy for 65-nm node and beyond

Nobuyuki Yoshioka, Kenichi Matsumura, Toru Tojo, 2004, Photomask Japan.

Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance

Nobuyuki Yoshioka, Ikunao Isomura, Takeshi Nishizaka, 2004, SPIE Photomask Technology.

Cost-effective pattern inspection system using Xe-Hg lamp in challenge of sub-65-nm node

Sang-Gyun Woo, Dong-Hoon Chung, Jinhyung Park, 2007, Photomask Japan.

Implementation strategy of wafer-plane and aerial-plane inspection for advanced mask manufacture

Han-Ku Cho, Jay Han, John Miller, 2009, Photomask Japan.

A pragmatic approach to high sensitivity defect inspection in the presence of mask process variability

Jinhyung Park, Sang-Gyun Woo, Dong-Hoon Chung, 2007, SPIE Photomask Technology.