Seong Woon Choi

EUV mask pattern inspection for memory mask fabrication in 45-nm node and below

Do-Young Kim, Seong Yong Cho, Hun Kim, 2006, SPIE Photomask Technology.

Feasibility study of mask fabrication in double exposure technology

Seong Yong Cho, Seong Woon Choi, Woo-Sung Han, 2006, SPIE Photomask Technology.

Process and chamber health monitoring of plasma enhanced ti deposition process through high performance VI-probe

Seong Woon Choi, Yongjin Kim, Woosung Han, 2007, 2007 International Symposium on Semiconductor Manufacturing.

Novel mask inspection flow for better defect review and analysis

Seong Woon Choi, Hideo Takizawa, Kouji Miyazaki, 2006, Photomask Japan.