Koji Asakawa

发表

Contactor of a circuit breaker from the repulsion

Koji Asakawa, Mitsuhiro Mitsushige, Akifumi Sato, 2004 .

Wide-range directed self-assembly lithography enabling wider range of applicable pattern size for both hexagonal multi-hole and line/space

Koji Asakawa, Ryuichi Saito, Seiji Morita, 2017, Advanced Lithography.

Aluminum nanowire polarizing grids: fabrication and analysis

Koji Asakawa, Vincent Pelletier, Mingshaw Wu, 2006, SPIE MOEMS-MEMS.

Quantum chemical studies of chemically amplified resist materials for electron-beam and ArF excimer laser

Koji Asakawa, Satoshi Saito, Naoko Kihara, 1994, Advanced Lithography.

Chemically amplified ArF resists based on cleavable alicyclic group and the absorption band shift method

Koji Asakawa, Naomi Shida, Makoto Nakase, 1998, Advanced Lithography.

Effect of basic additives on sensitivity and diffusion of acid in chemical amplification resists

Koji Asakawa, Makoto Nakase, Tohru Ushirogouchi, 1995, Advanced Lithography.

Undervoltage tripping device with leading auxiliary switch for circuit breaker

Masao Miura, Koji Asakawa, Takeshi Emura, 2002 .

High resolution positive-working molecular resist attached with alicyclic acid-leaving group

Takeshi Koshiba, Koji Asakawa, Tetsuro Nakasugi, 2010, Advanced Lithography.

Chemically amplified resists using the absorption band shift method in conjunction with alicyclic compounds for ArF excimer laser lithography

Koji Asakawa, Naomi Shida, Tohru Ushirogouchi, 1999, Advanced Lithography.

Chemically ampilified ArF excimer laser resists using the absorption band shift method

Koji Asakawa, Naomi Shida, Takuya Naito, 1995, Advanced Lithography.

Advanced materials for 193-nm resists

Tatsuya Nakano, Koji Asakawa, Satoshi Saito, 2000, Advanced Lithography.

Break mechanism for automatic switches

Kentaro Toyama, Koji Asakawa, Tatsunori Takahashi, 2000 .

Effect of substituent groups of phenol-derivative dissolution inhibitors on inhibition efficiency

Koji Asakawa, Naoko Kihara, Takuya Naito, 1996, Advanced Lithography.

Novel molecular resist based on an amorphous truxene derivative

Takeshi Koshiba, Koji Asakawa, Tetsuro Nakasugi, 2008, SPIE Advanced Lithography.

193-nm single-layer resists based on advanced materials

Tatsuya Nakano, Koji Asakawa, Naomi Shida, 2001, SPIE Advanced Lithography.

Mechanism of amine additive in chemically amplified resist visualized by using Monte Carlo simulation

Koji Asakawa, Makoto Nakase, Tohru Ushirogouchi, 1995, Advanced Lithography.

Tripping device in case of undervoltage having an early auxiliary switch for a circuit breaker

Masao Miura, Koji Asakawa, 2002 .

Preventing method of volume expansion of polymer after metal infiltration

Koji Asakawa, Norikatsu Sasao, Shinobu Sugimura, 2021, Advanced Lithography.

2.5-inch disk patterned media prepared by an artificially assisted self-assembling method

Koji Asakawa, Katsuyuki Naito, Yoshiyuki Kamata, 2002 .

DIFFUSION OF ACID AND ACTIVATION ENERGY OF POSITIVE CHEMICAL AMPLIFICATION RESIST

Koji Asakawa, 1993 .

Nano-structured surface fabrication for higher luminescent LED by self-assembled block copolymer lithography

Koji Asakawa, Akira Fujimoto, 2007 .

Effect of remaining solvent on sensitivity, diffusion of acid, and resolution in chemical amplification resists

Koji Asakawa, Makoto Nakase, Tohru Ushirogouchi, 1995 .

Silicon Wire Grid Polarizer for Deep UV Fabricated by Diblock Copolymer Lithography

Koji Asakawa, Vincent Pelletier, Richard A. Register, 2007 .

Silicon nanowire grid polarizer for very deep ultraviolet fabricated from a shear-aligned diblock copolymer template.

Koji Asakawa, Douglas H Adamson, Paul M Chaikin, 2007, Optics letters.

Nanopatterning with Microdomains of Block Copolymers using Reactive-Ion Etching Selectivity

Koji Asakawa, K. Asakawa, Toshiro Hiraoka, 2002 .

Highly Transparent Chemically Amplified ArF Excimer Laser Resists by Absorption Band Shift for 193 nm Wavelength

Koji Asakawa, Naomi Shida, Takuya Naito, 1994 .

Highly sensitive positive-working molecular resist based on new molecule

Koji Asakawa, Tetsuro Nakasugi, Satoshi Saito, 2009 .

Relationship between remaining solvent and diffusion of acid in chemical amplification resists.

Koji Asakawa, Makoto Nakase, Tohru Ushirogouchi, 1994 .

Nano-Patterning for Patterned Media using Block-Copolymer

Koji Asakawa, Katsuyuki Naito, Yoshiyuki Kamata, 2002 .

Blockcopolymer Self-Assembly Directed by Photochemically Attached Polymer Surface Layer

Koji Asakawa, Tsukasa Azuma, Hiroko Nakamura, 2011 .

Molecular Design of Acid Generators for EB and ArF Excimer Laser Exposure Using Molecular Orbital Calculations.

Koji Asakawa, Satoshi Saito, Takuya Naito, 1994 .