Christoph Brandstaetter

Proof-of-concept tool development for projection mask-less lithography (PML2)

Hans Loeschner, Hans-Joachim Doering, Klaus Reimer, 2005, SPIE Advanced Lithography.

Efficient full-color electroluminescence and stimulated emission with polyphenylenes

Egbert Zojer, Ullrich Scherf, Roland Resel, 1998, Optics & Photonics.

Demonstrators: a vital step forward for projection mask-less lithography (PML2)

Hans Loeschner, Ramona Eberhardt, Hans-Joachim Doering, 2005, Other Conferences.

Projection mask-less lithography (PML2): First results from the multi beam blanking demonstrator

Hans-Joachim Doering, Klaus Reimer, Ernst Haugeneder, 2006 .