Takashi Adachi

发表

Extendibility of single mask exposure for practical ArF immersion lithography

Yasutaka Morikawa, Naoya Hayashi, Takashi Adachi, 2007, Photomask Japan.

Pattern decomposition for double patterning from photomask viewpoint

Yasutaka Morikawa, Naoya Hayashi, Takashi Adachi, 2007, SPIE Advanced Lithography.

Study of CD variation at EUV mask fabrication occurred by electric conduction from top to back side

Tadahiko Takikawa, Masamitsu Itoh, Naoya Hayashi, 2009, Photomask Japan.

P-IMG-04 BEAD CARRY-OUT IN TWO-COMPONENT BRUSH SYSTEM OF ELECTROPHOTOGRAPHY(Imaging and Printing Technologies,Technical Program of Poster Session)

Hiroyuki Kawamoto, Takashi Adachi, Satoshi Iesaka, 2009 .

45-32-nm node photomask technology with water immersion lithography

Yasutaka Morikawa, Naoya Hayashi, Takashi Adachi, 2006, SPIE Photomask Technology.

EUV mask process development status for full field EUV exposure tool

Naoya Hayashi, Takashi Adachi, Hiroshi Mohri, 2008, Photomask Japan.

In-field CD uniformity control by altering transmission distribution of the photomask using ultra-fast pulsed laser technology

Yasutaka Morikawa, Naoya Hayashi, Takashi Adachi, 2006, Photomask Japan.

Approach to analyze decomposition impact for photomask fabrication

Yasutaka Morikawa, Naoya Hayashi, Takashi Adachi, 2007, Photomask Japan.

Study of the mask materials for PTD process and NTD process in practical ArF immersion lithography

Takashi Adachi, Katsuya Hayano, Hideyoshi Takamizawa, 2014, Photomask and Next Generation Lithography Mask Technology.

FLOW VISUALIZATION AND ANALYSIS AROUND AN ALTERNATOR

Takashi Adachi, Tateyuki Suzuki, Susumu Kobayashi, 1991 .

PSM quartz etch depth evaluation with an atomic force microscope

Yasutaka Morikawa, Naoya Hayashi, Takashi Adachi, 2003, Photomask Japan.

Development of new high transmission eaPSM for Negative Tone Development process on wafer

Yasutaka Morikawa, Takashi Adachi, Katsuya Hayano, 2015, Other Conferences.

Lithographic performance comparison with various RET for 45-nm node with hyper NA

Yasutaka Morikawa, Naoya Hayashi, Takashi Adachi, 2006, Photomask Japan.

Characteristics optimization of mask materials for hyper-NA lithography

Yasutaka Morikawa, Naoya Hayashi, Takashi Adachi, 2007, European Mask and Lithography Conference.

Pupil plane analysis on AIMS 45-193i for advanced photomasks

Yasutaka Morikawa, Naoya Hayashi, Takashi Adachi, 2007, SPIE Advanced Lithography.

Lithographic performance of a new “low-k” mask

Yasutaka Morikawa, Hiroyuki Miyashita, Takashi Adachi, 2016, Photomask Japan.

Optimization of Alt-PSM structure for 45nm node ArF immersion lithography

Yasutaka Morikawa, Naoya Hayashi, Takashi Adachi, 2005, SPIE Photomask Technology.

Analysis of diffraction orders including mask topography effects for OPC optimization

Yasutaka Morikawa, Naoya Hayashi, Takashi Adachi, 2007, SPIE Advanced Lithography.

Transfer impedance of new-type calibration target and reconstruction of injected currents for air discharges from electrostatic discharge generators

Osamu Fujiwara, Yoshinori Taka, Takashi Adachi, 2010, IEICE Electron. Express.

An Approach to Predict Drive-by-Download Attacks by Vulnerability Evaluation and Opcode

Kazumasa Omote, Takashi Adachi, 2015, 2015 10th Asia Joint Conference on Information Security.

An experimental analysis on shock reflection over the two‐dimensional model of a dust layer

Takashi Adachi, Tateyuki Suzuki, Susumu Kobayashi, 2008 .

Takashi Adachi, Susumu Kobayashi, T. Suzuki, 2000 .

Shock tube study of particles' motion behind a planar shock wave

Takashi Adachi, Yoshitaka Sakamura, Yuichi Funawatashi, 2005 .

Reconstruction of discharge currents injected on calibration target from electrostatic discharge generators

Osamu Fujiwara, Yoshinori Taka, Takashi Adachi, 2007, EMC 2007.

Measurement and Validation of Transfer Impedance of IEC Calibration Current Target for Electrostatic Discharge Generators

Osamu Fujiwara, Yoshinori Taka, Takashi Adachi, 2012 .

An experimental analysis of oblique shock reflection over a two-dimensional multi-guttered wedge

Takashi Adachi, Tateyuki Suzuki, Susumu Kobayashi, 1992 .