Ira Reiss

Progress towards the development of a commercial tool and process for EUVL mask blanks

Paul B. Mirkarimi, Andy Ma, Patrick Kearney, 2005, SPIE Advanced Lithography.

Ion beam deposition for defect-free EUVL mask blanks

Patrick Kearney, Takashi Sugiyama, Eberhard Spiller, 2009, European Mask and Lithography Conference.

Defect mitigation and reduction in EUVL mask blanks

Andy Ma, Patrick Kearney, Eberhard Spiller, 2007, SPIE Advanced Lithography.

Enabling defect-free masks for extreme ultraviolet lithography

Andy Ma, Patrick Kearney, Chan-Uk Jeon, 2007, European Mask and Lithography Conference.

Recent progress in the fabrication of low defect density mask blanks

Paul B. Mirkarimi, Patrick A. Kearney, Andy Ma, 2005, Photomask Japan.

Ion beam deposition for defect-free EUVL mask blanks

Patrick Kearney, Takashi Sugiyama, Eberhard Spiller, 2008, SPIE Advanced Lithography.

Progress in the fabrication of low-defect density mask blanks for extreme ultraviolet lithography

Paul B. Mirkarimi, Andy Ma, Eberhard Spiller, 2006 .