J. Shin

Improvements in MoSi EAPSM CD bias and iso-dense linearity plasma etch results utilizing design of experiments process optimization of Gen III ICP plasma source

Jason Plumhoff, Chris Constantine, Emmanuel Rausa, 2002, Photomask Japan.

Investigation of MoSi etch processes for embedded attenuating phase shift mask applications utilizing a next-generation ICP source

Jason Plumhoff, Chris Constantine, C. Strawn, 2002, SPIE Photomask Technology.