Yasuyuki Unno

Polarization effect of illumination light

Yasuyuki Unno, 1993, Advanced Lithography.

Analyses of imaging performance degradation caused by birefringence residual in lens materials

Akiyoshi Suzuki, Yasuyuki Unno, A. Suzuki, 2001, SPIE Advanced Lithography.

Through-the-mask (TTM) optical alignment for high volume manufacturing nanoimprint lithography systems

Takamitsu Komaki, Kazuhiko Mishima, Kazuhiro Takahashi, 2020 .

Resolution limit for two-dimensional crossed-grating patterns projected by a coherent beam.

Yasuyuki Unno, 2003, Applied optics.

Analyses of imaging performance degradation caused by birefringence residual in lens materials

Akiyoshi Suzuki, Yasuyuki Unno, 2002 .

Point-spread function for a rotationally symmetric birefringent lens.

Yasuyuki Unno, 2002, Journal of the Optical Society of America. A, Optics, image science, and vision.

Impact of mask errors and lens aberrations on the image formation by a vortex mask

Takeaki Ebihara, Yasuyuki Unno, Marc D. Levenson, 2005 .