Augustin Jeyakumar

Material design and evaluation of nanocomposite resist for next generation lithography

Clifford L. Henderson, Kim Dean, Kenneth E. Gonsalves, 2005, SPIE Advanced Lithography.

Direct photopatterning of metal oxide materials using photosensitive organometallic precursor films

Clifford L. Henderson, Augustin Jeyakumar, Sean Barstow, 2002, SPIE Advanced Lithography.

Enhancing the electron beam sensitivity of hydrogen silsesquioxane (HSQ)

Clifford L. Henderson, Augustin Jeyakumar, C. Henderson, 2004, SPIE Advanced Lithography.

A comparative study between organic and inorganic resists in electron beam lithography using Monte Carlo simulations

Clifford L. Henderson, Augustin Jeyakumar, C. Henderson, 2003, SPIE Advanced Lithography.

Hybrid bilayer imaging approach using single component metal-organic precursors for high-resolution electron beam lithography

Clifford L. Henderson, Paul J. Roman, Augustin Jeyakumar, 2003, SPIE Advanced Lithography.

Nanocomposite resist for low-voltage electron beam lithography (LVEBL)

Ankur Agrawal, Clifford L. Henderson, Kenneth E. Gonsalves, 2003, SPIE Advanced Lithography.

Novel bilayer resist approach using radiation sensitive organometalics precursors

Clifford L. Henderson, Augustin Jeyakumar, Sean Barstow, 2002, SPIE Advanced Lithography.