Todd C. Bailey

发表

Reflectivity-induced variation in implant layer lithography

Hyung-Rae Lee, Todd C. Bailey, Greg McIntyre, 2008, SPIE Advanced Lithography.

Employing Step-and-Flash imprint lithography for gate-level patterning of a MOSFET device

William J. Dauksher, Kevin J. Nordquist, Todd C. Bailey, 2003, SPIE Advanced Lithography.

Step and flash imprint lithography: a new approach to high-resolution patterning

Bernard Choi, S. V. Sreenivasan, Todd C. Bailey, 1999, Advanced Lithography.

Substrate aware OPC rules for edge effect in block levels

Todd C. Bailey, Ian Stobert, Irene Popova, 2010, Photomask Technology.

New methods for fabricating step and flash imprint lithography templates

William J. Dauksher, Kevin J. Nordquist, Eric S. Ainley, 2002, Workshop on Nanostructure Science, Metrology, and Technology.

Leveraging advanced data analytics, machine learning, and metrology models to enable critical dimension metrology solutions for advanced integrated circuit nodes

Todd C. Bailey, Yunlin Zhang, Narender Rana, 2014 .

Precise CD-SEM metrology of resist patterns at around 20 nm for 0.33NA EUV lithography

Scott Halle, Atsuko Yamaguchi, Shunsuke Koshihara, 2014, Advanced Lithography.

High-resolution templates for step and flash imprint lithography

William J. Dauksher, Kevin J. Nordquist, Eric S. Ainley, 2002, SPIE Advanced Lithography.

Novel in-line metrology methods for Fin pitch walking monitoring in 14nm node and beyond

Todd C. Bailey, Yunlin Zhang, Robin Chao, 2014, Advanced Lithography.

3D physical modeling for patterning process development

Will Conley, Todd C. Bailey, Derren Dunn, 2010, Advanced Lithography.

Advances in Step and Flash imprint lithography

William J. Dauksher, Todd C. Bailey, C. Grant Willson, 2003, SPIE Advanced Lithography.

Imprint lithography: lab curiosity or the real NGL

William J. Dauksher, Todd C. Bailey, C. Grant Willson, 2003, SPIE Advanced Lithography.

Machine learning and predictive data analytics enabling metrology and process control in IC fabrication

Todd C. Bailey, Yunlin Zhang, Narender Rana, 2015, Advanced Lithography.

Methodology for determining critical dimension scanning electron microscope measurement condition of sub-20 nm resist patterns for 0.33 NA extreme ultraviolet lithography

Scott Halle, Atsuko Yamaguchi, Shunsuke Koshihara, 2016 .

Multitechnique metrology methods for evaluating pitch walking in 14 nm and beyond FinFETs

Todd C. Bailey, Yunlin Zhang, Gangadhara Raja Muthinti, 2014 .

Physical resist model calibration for implant level using laser-written photomasks

Emily Gallagher, Todd C. Bailey, Bidan Zhang, 2010, Photomask Technology.

Evaluation of ArF lithography for 45-nm node implant layers

Todd C. Bailey, Bidan Zhang, Irene Popova, 2007, SPIE Advanced Lithography.

Step and flash imprint lithography: Defect analysis

Todd C. Bailey, Matthew E. Colburn, John G. Ekerdt, 2001 .

Methodology for determining CD-SEM measurement condition of sub-20nm resist patterns for 0.33NA EUV lithography

Scott Halle, Shunsuke Koshihara, Junichi Tanaka, 2015, Advanced Lithography.

3D lithography modeling for ground rule development

Todd C. Bailey, Chandra Sarma, Dongbing Shao, 2011, Advanced Lithography.

First microprocessors with immersion lithography

Todd C. Bailey, Naftali E. Lustig, Karen Petrillo, 2004, SPIE Advanced Lithography.

Three-dimensional physical photoresist model calibration and profile-based pattern verification

Will Conley, Todd C. Bailey, Amr Y. Abdo, 2010, Advanced Lithography.

Leveraging data analytics, patterning simulations and metrology models to enhance CD metrology accuracy for advanced IC nodes

Todd C. Bailey, Yunlin Zhang, Narender Rana, 2014, Advanced Lithography.

Imprint lithography for integrated circuit fabrication

William J. Dauksher, Kevin J. Nordquist, Todd C. Bailey, 2003 .

Message to the undecided: using DUV dBARC for 32 nm node implants

Hyung-Rae Lee, Todd C. Bailey, Juan-Manuel Gomez, 2009, Advanced Lithography.

Characterization and modeling of volumetric and mechanical properties for step and flash imprint lithography photopolymers

Todd C. Bailey, C. Grant Willson, Matthew E. Colburn, 2001 .

Step and Flash Imprint Lithography: A Technology Review

Todd C. Bailey, Michael D. Stewart, Matthew E. Colburn, 2000 .

Development and advantages of step-and-flash lithography

Todd C. Bailey, Matthew E. Colburn, John G. Ekerdt, 2001 .

Fabrication of multi-tiered structures on step and flash imprint lithography templates

S. V. Sreenivasan, William J. Dauksher, Kevin J. Nordquist, 2003 .

PARTIALLY CONSTRAINED COMPLIANT STAGES FOR HIGH RESOLUTION IMPRINT LITHOGRAPHY

Todd C. Bailey, Matthew E. Colburn, Sidlgata V. Sreenivasan, 2000 .

High resolution templates for step and flash imprint lithography

William J. Dauksher, Kevin J. Nordquist, Eric S. Ainley, 2002 .

Template fabrication schemes for step and flash imprint lithography

A. Alec Talin, William J. Dauksher, Kevin J. Nordquist, 2002 .

Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology

Todd C. Bailey, Douglas J. Resnick, John G. Ekerdt, 2002 .

Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates

S. V. Sreenivasan, Kevin J. Nordquist, Eric S. Ainley, 2002 .

Improved step and flash imprint lithography templates for nanofabrication

S. V. Sreenivasan, William J. Dauksher, Kevin J. Nordquist, 2003 .