Oleg Kritsun

发表

Advanced diffraction-based overlay for double patterning

Jie Li, Yongdong Liu, Prasad Dasari, 2010, Advanced Lithography.

Lithography process control using scatterometry metrology and semi-physical modeling

Alok Vaid, Oleg Kritsun, Kevin R. Lensing, 2007, SPIE Advanced Lithography.

Fast and accurate laser bandwidth modeling of optical proximity effects

Nigel R. Farrar, Oleg Kritsun, Chris Sallee, 2007, SPIE Photomask Technology.

Faster diffraction-based overlay measurements with smaller targets using 3D gratings

Jie Li, Yongdong Liu, Prasad Dasari, 2012, Advanced Lithography.

Evaluating scatterometry 3D capabilities for EUV

Jie Li, Prasad Dasari, Jiangtao Hu, 2013, Advanced Lithography.

EUV OPC for the 20-nm node and beyond

Lei Sun, Obert R. Wood, Harry J. Levinson, 2012, Advanced Lithography.

Advancements of diffraction-based overlay metrology for double patterning

Jie Li, Yongdong Liu, Prasad Dasari, 2011, Advanced Lithography.

Scatterometry evaluation of focus-dose effects of EUV structures

Jie Li, Prasad Dasari, Jiangtao Hu, 2013, Advanced Lithography.

Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry

Harry J. Levinson, Bruno La Fontaine, Oleg Kritsun, 2007, SPIE Advanced Lithography.

Diffraction-based overlay metrology for double patterning technologies

Jie Li, Prasad Dasari, Nigel Smith, 2009, Advanced Lithography.

Evaluating diffraction based overlay metrology for double patterning technologies

Bruno La Fontaine, Prasad Dasari, Oleg Kritsun, 2008, SPIE Advanced Lithography.

Metrology characterization of spacer double patterning by scatterometry

Jie Li, Prasad Dasari, Jiangtao Hu, 2011, Advanced Lithography.

Application of phase shift focus monitor in EUVL process control

Sudhar Raghunathan, Iacopo Mochi, Vibhu Jindal, 2013, Advanced Lithography.

Calibrating OPC model with full CD profile data for 2D and 3D patterns using scatterometry

Aasutosh Dave, Jiangtao Hu, Yunfei Deng, 2009, Advanced Lithography.

Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography

Harry J. Levinson, Bruno La Fontaine, Oleg Kritsun, 2007, SPIE Advanced Lithography.

Simultaneous overlay and CD measurement for double patterning: scatterometry and RCWA approach

Jungchul Park, Jie Li, Prasad Dasari, 2009, Advanced Lithography.

Scatterometry characterization of spacer double patterning structures

Prasad Dasari, Jiangtao Hu, Oleg Kritsun, 2010, Advanced Lithography.

Characterization of a 0.25NA full-field EUV exposure tool

Jie Li, Bruno La Fontaine, Oleg Kritsun, 2009, Advanced Lithography.

Extending scatterometry to the measurements of sub 40 nm features, double patterning structures, and 3D OPC patterns

Bruno La Fontaine, Oleg Kritsun, Yongdong Liu, 2008, SPIE Advanced Lithography.

Scatterometry metrology challenges of EUV

Jie Li, Prasad Dasari, Jiangtao Hu, 2012, Advanced Lithography.

Defining a physically accurate laser bandwidth input for optical proximity correction (OPC) and modeling

Nigel R. Farrar, Oleg Kritsun, Mark D. Smith, 2008, Photomask Technology.

Scatterometry characterization of spacer double patterning structures

Prasad Dasari, Jiangtao Hu, Oleg Kritsun, 2010 .

Improving lithography pattern fidelity and line-edge roughness by reducing laser speckle

Harry J. Levinson, Nigel R. Farrar, Oleg Kritsun, 2008 .

Fourier spectrum method to determine dose-to-clear in a photoresist.

Sudhar Raghunathan, Pawitter Mangat, Oleg Kritsun, 2014, Optics letters.