Georg Erley

Focus budget improvement using optimized wafer edge settings

Boris Habets, Xaver Thrun, Lucas Lamonds, 2019, Advanced Lithography.

Understanding overlay signatures using machine learning on non-lithography context information

Boris Habets, Stefan Buhl, Xaver Thrun, 2018, Advanced Lithography.

Overlay improvement using Legendre-Zernike model-based overlay corrections and monitoring with interpolated metric

Boris Habets, Stefan Buhl, Enrico Bellmann, 2015, Advanced Lithography.

Excursion detection using leveling data

Boris Habets, Enrico Bellmann, Seop Kim, 2016, SPIE Advanced Lithography.

Higher order intra-field alignment for intra-wafer lens and reticle heating control

Boris Habets, Charlie Chen, Patrick Lomtscher, 2018, Advanced Lithography.

Focus leveling improvement using optimized wafer edge settings

Boris Habets, Xaver Thrun, Lucas Lamonds, 2019 .