Kai Dr. Gäbel

Technology for LPP Sources

Uwe Stamm, Kai Dr. Gäbel, 2006 .

High-power EUV lithography sources based on gas discharges and laser-produced plasmas

Uwe Stamm, Denis Bolshukhin, Guido Schriever, 2003, SPIE Advanced Lithography.

New crystal spectrograph designs and their application to plasma diagnostics (invited)

Ingo Uschmann, E. Förster, Kai Dr. Gäbel, 1992 .

Verification of X-ray line coincidences by high-resolution spectroscopy

Ernst E. Fill, Ingo Uschmann, E. Förster, 1993 .

X-ray microscopy of laser-produced plasmas with the use of bent crystals

Ingo Uschmann, E. Förster, Kai Dr. Gäbel, 1991 .

X‐ray reflection properties of elastically bent perfect crystals in Bragg geometry

Ingo Uschmann, E. Förster, Kai Dr. Gäbel, 1993 .