Chang Wan Bae

The study of novel PAG containing acid amplifier in EUV resist material

Jin-Ho Kim, Joon Hee Han, Hyun Soon Lim, 2013, Advanced Lithography.

The factors affecting improvement sensitivity, CDU, and resolution in EUV resist

Jin-Ho Kim, Joon Hee Han, Dong-Chul Seo, 2014, Advanced Lithography.