Albrecht Ullrich
发表
Jan Richter,
Albrecht Ullrich,
2009,
Photomask Technology.
Stefan Meusemann,
Jan Heumann,
Clemens Utzny,
2012,
Photomask Technology.
Andreas Fischer,
Frank Scholze,
Victor Soltwisch,
2015,
Advanced Lithography.
Guido Schiffelers,
Shinpei Kondo,
Norihito Fukugami,
2014,
Photomask and Next Generation Lithography Mask Technology.
Rolf Seltmann,
Stefan Meusemann,
Jan Heumann,
2012,
Photomask Technology.
Black border, mask 3D effects: covering challenges of EUV mask architecture for 22nm node and beyond
Guido Schiffelers,
Shinpei Kondo,
Norihito Fukugami,
2014,
European Mask and Lithography Conference.
Frank Scholze,
Victor Soltwisch,
Bernd Bodermann,
2014,
European Mask and Lithography Conference.
Albrecht Ullrich,
A. Ullrich,
2010,
Photomask Technology.