Osamu Nagano

Maskless lithography: a low-energy electron-beam direct writing system with a common CP aperture and the recent progress

Katsuya Okumura, Ichiro Mori, Ryoichi Inanami, 2003, SPIE Advanced Lithography.

Control of pulse arc welding.

Masanori Mizuno, Yoshihiro Ueda, Shigeo Ueguri, 1993 .

Japanese Industry as it should be from a Structural Standpoint( The Current Trend of Mechanical Engineering)

Osamu Nagano, 1977 .

Hot spot management with die-to-database wafer inspection system

Soichi Inoue, Kohji Hashimoto, Satoshi Usui, 2008, SPIE Advanced Lithography.

A Review on Research and Development

Osamu Nagano, 1980 .

Tolerance-Based Wafer Verification Methodologies with a Die-to-Database Inspection System

Soichi Inoue, Kohji Hashimoto, Toshiya Kotani, 2009 .

Dynamic changes of NADH fluorescence images and NADH content during spreading depression in the cerebral cortex of gerbils 1 1 Published on the World Wide Web on 22 June 2000.

Osamu Nagano, Yoshimasa Takeda, Y. Takeda, 2000, Brain Research.