Cornel Bozdog

发表

FTIR based nondestructive method for metrology of depths in poly silicon-filled trenches

Peter A. Rosenthal, Shoaib H. Zaidi, George Stojakovic, 2003, SPIE Advanced Lithography.

Advanced in-line optical metrology of sub-10nm structures for gate all around devices (GAA)

Nelson Felix, Raja Muthinti, Cornel Bozdog, 2016, SPIE Advanced Lithography.

Optical metrology for advanced process control: full module metrology solutions

Cornel Bozdog, Igor Turovets, 2016, SPIE Advanced Lithography.

A holistic metrology approach: multi-channel scatterometry for complex applications

Alok Vaid, Cornel Bozdog, Susan Emans, 2011, Advanced Lithography.

Hybrid metrology universal engine: co-optimization

Alok Vaid, Cornel Bozdog, Shay Wolfling, 2014, Advanced Lithography.

Improved scatterometry time-to-solution using virtual reference

Alok Vaid, Cornel Bozdog, Jamie Tsai, 2015, Advanced Lithography.

Characterization methodology to support process development of advanced patterning structures

Alok Vaid, Cornel Bozdog, Xuefeng Zeng, 2013, ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference.

Holistic metrology approach: hybrid metrology utilizing scatterometry, critical dimension-atomic force microscope and critical dimension-scanning electron microscope

Peter Ebersbach, Charles N. Archie, Alok Vaid, 2011 .

Hybrid metrology solution for 1X node technology

Alok Vaid, Hiroki Kawada, Cornel Bozdog, 2012, Advanced Lithography.

Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry gratings

Nelson Felix, Timothy A. Brunner, Alok Vaid, 2010, Advanced Lithography.

Product-driven material characterization for improved scatterometry time-to-solution

Carsten Hartig, Alok Vaid, Cornel Bozdog, 2009, Advanced Lithography.

Measuring self-aligned quadruple patterning pitch walking with scatterometry-based metrology utilizing virtual reference

Alok Vaid, Prasad Dasari, Cornel Bozdog, 2016 .

Hybrid metrology: from the lab into the fab

Alok Vaid, Cornel Bozdog, Shay Wolfling, 2014 .

Hybrid enabled thin film metrology using XPS and optical

Alok Vaid, Prasad Dasari, Cornel Bozdog, 2016, SPIE Advanced Lithography.

Implementation of hybrid metrology at HVM fab for 20nm and beyond

Alok Vaid, John Taylor, Cornel Bozdog, 2013, Advanced Lithography.

Advanced in-line metrology strategy for self-aligned quadruple patterning

Nelson Felix, Raja Muthinti, Mary Breton, 2016, SPIE Advanced Lithography.

A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM

Peter Ebersbach, Alok Vaid, Cornel Bozdog, 2011, Advanced Lithography.

Hybrid metrology implementation: server approach

Alok Vaid, Cornel Bozdog, Padraig Timoney, 2015, Advanced Lithography.

Hybrid approach to optical CD metrology of directed self-assembly lithography

Masafumi Asano, Akiko Kawamoto, Cornel Bozdog, 2013, Advanced Lithography.

Mueller matrix characterization using spectral reflectometry

Cornel Bozdog, Matthew Sendelbach, Shay Wolfling, 2013, Optical Metrology.

Hybrid metrology co-optimization of critical dimension scanning electron microscope and optical critical dimension

Alok Vaid, Cornel Bozdog, Shay Wolfling, 2014 .

Scatterometry-based defect detection for DSA in-line process control

Nelson Felix, Cornel Bozdog, Robin Chao, 2015, Advanced Lithography.

Scatterometry-based metrology for SAQP pitch walking using virtual reference

Alok Vaid, Fang Fang, Prasad Dasari, 2016, SPIE Advanced Lithography.

Novel diffraction-based overlay metrology utilizing phase-based overlay for improved robustness

Ewoud van West, Elliott McNamara, Cornel Bozdog, 2021, Advanced Lithography.

Plasma-assisted CD shrink and overlay metrology techniques for double patterning

Cornel Bozdog, Michael Sendler, Peter Cirigliano, 2007, 2007 International Symposium on Semiconductor Manufacturing.

Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry targets

Nelson Felix, Timothy A. Brunner, Alok Vaid, 2010 .